等离子清洗机 Plasma cleaning machine

     等离子清洗原理是在真空状态下使电极之间形成高频交变电场，区域内气体在交变电场的激荡下，形成等离子体，活性等离子对被清洗物进行物理轰击与化学反应双重作用，使被清洗物表面物质变成粒子和气态物质，经过抽真空排出，而达到清洗目的。 等离子体清洗设备作为一种精密干法清洗设备，应用于半导体、厚膜电路、元器件封装前、COG前、真空电子、连接器和继电器等行业的精密清洗，塑料、橡胶、金属和陶瓷等表面的活化以及生命科学实验等。

    The principle of plasma cleaning is to form high frequency alternating electric field between the electrodes in the vacuum environment, under this condition, the gas in the area forms plasma as well as reactive plasma to let the material to be cleaned have physical bombing and chemical reaction, thus the surface of the material to be cleaned becomes particles and gaseous substances which are excavated by vacuum pump, then the cleaning is finished. Plasma cleaning machine, as precise dry-cleaning equipment, is applied to the precise cleaning in some industry like semiconductor, thick film circuit, preceding components sealing, preceding COG, vacuum electronics, connectors and relays, and to make activation and life science experiment about the surface of plastic, rubber, metal and ceramic.

     可根据客户要求订制 The machine can be made according to the customer’s requirements